Rudolph debuts thin-film metrology system for transparent films

05/6/2013 | EE Times Asia (free registration)

Rudolph Technologies has introduced the S3000SX thin-film metrology system, intended to work with transparent films used in fabricating semiconductors with 28-nanometer dimensions or finer. "Scaling to the 2x and 1x nodes continues to introduce novel materials, thinner multi-layer film stacks, and the need for fast, accurate, on-product metrology," Rudolph's Mike Colgan said.

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